Fast Near-Interface Traps in 4H-SiC MOS Capacitors Measured by an Integrated-Charge Method

نویسندگان

چکیده

Oxide traps existing in 4H-SiC MOS capacitors with fast response times that are active the strong accumulation and depletion regions were characterized by an integrated-charge method. The method is based on measurement of charging discharging voltages across to high-frequency voltage pulses. This can identify order hundreds nanoseconds. results reveal increasing density near-interface energy levels above bottom conduction band, which defects reducing channel-carrier mobility MOSFETs.

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ژورنال

عنوان ژورنال: IEEE Access

سال: 2021

ISSN: ['2169-3536']

DOI: https://doi.org/10.1109/access.2021.3102614